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Electroless and Chemical Metal Deposition on Human Tooth Enamel
Thomas J. O'Keefe
Graduate Center for Materials Research, University of Missouri-Rolla, Rolla, Missouri 65401, USA
Richard D. Christie
Graduate Center for Materials Research, University of Missouri-Rolla, Rolla, Missouri 65401, USA
The feasibility of depositing a thin metal film onto tooth enamel has been demonstrated. The process employs chemical solutions containing ions of the metal to be deposited and suitable reducing agent solutions. The deposits are quite adherent and exhibit the normal properties of the bulk metal.
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Journal of Dental Research, Vol. 56, No. 6,
595-602 (1977)
DOI: 10.1177/00220345770560060701

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T.J. O'Keefe, R.A. Narasagoudar, and L.A. Anderson
Materials Science Deposition Rate of Metallic Ag on Ivory and Enamel
Journal of Dental Research,
February 1, 1982;
61(2):
408 - 411.
[Abstract]
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